Waferpedia

Comparison ledger

, Tokyo Semitsu Kogaku (TSK) UF200versusELP300 Gen2

Accretech , Tokyo Semitsu Kogaku (TSK) UF200, SUSS MicroTec ELP300 Gen2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
ELP300 Gen2SUSS MicroTec
OEMAccretechSUSS MicroTec
Category——
Wafer sizeWafer Equipment300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation—Gen2
FamilyAccretech , Tokyo Semitsu Kogaku (TSK) UF200SUSS MicroTec ELP300 Gen2
Specifications
Wafer sizeWafer Equipment[1]—
Date of Manufacture1998[1]—
Currently Configured for200mm[1]—
Current Equipment StatusAvailable[1]—
Available dateCurrently Available[1]—
Equipment categoryProduction Wafer Prober[1]—
Automation—Automated[2]
Wafer Size—up to 300 mm[2]
Laser Type—Excimer Laser[2]
Processes—Alignment, Ablation, Laser-Assisted Debonding, Laser Seed Layer Removal[2]
Sources (2)Every fact above is drawn from these public sources
  1. [1]dealer listingwotol.com
  2. [2]hilpert.chhilpert.ch