Comparison ledger
Agilent 1200 HPLC, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1200 HPLCAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 12xx | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Configuration | Degasser B1379B[1] | WP AL 300mm PVD[4] |
| Make | Agilent[1] | — |
| Model | 1200[1] | 0010-03485[4] |
| System type | HPLC system[2] | — |
| Included modules | Degasser, Binary Pump, DAD, TCC, ALS, FC/ALS Therm[1] | — |
| Includes | Degasser, Pump, Autosampler, Thermostatted Column Compartment, Detector, Data system[2] | — |
| Maximum pressure | up to 600 bar[2] | — |
| Maximum operating pressure | 400 bar / 5880 psi (standard 1200 Series) / 600 bar / 8700 psi (1200 Series RRLC)[3] | — |
| Flow rate range | 0.05 to 5 mL/min[2] | — |
| Column compartment temperature range | 10°C below ambient to 100°C[2] | — |
| Detector options | DAD, VWD, FLD, RID, ELSD[2] | — |
| Detector wavelength range | 190 to 950 nm (DAD) / 190 to 600 nm (VWD)[3] | — |
| OEM | — | Applied Materials[4] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[5] |
| Process | — | PVD[6] |
| Wafer size | — | 300mm[7] |
| Version | — | Spares[7] |
| Part Number | — | 0010-03485[4] |
| Manufacturer | — | Applied Materials[4] |
| Process Type | — | PVD (Physical Vapor Deposition)[4] |
| Application (Material) | — | Aluminum (AL)[4] |
| Wafer Diameter (associated) | — | 300 mm[4] |