Comparison ledger
Agilent 1290 Infinity II UHPLC, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1290 Infinity II UHPLCAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 1290 | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| including | Flex Pump (G7104A) with Degasser, MCT (G7116B) with Thermostat, MultiSampler (G7167A) & Solvent TrayComputer Loaded with MassHunter and workstation.[1] | — |
| System type | UHPLC / LC system[1] | — |
| Pump option | Flexible Pump (G7104A) with degasser[1] | — |
| Sampler | Multisampler (G7167A)[1] | — |
| Thermostat | MCT (G7116B) with thermostat[1] | — |
| Detector options | Diode Array Detector (DAD) or Variable Wavelength Detector (VWD)[2] | — |
| Sample capacity | Up to 6144 samples[2] | — |
| Injection cycle | Faster injection cycles, under 5 seconds[2] | — |
| System pressure | Up to 1300 bar[2] | — |
| Product name | Agilent 1290 Infinity II UHPLC System[1] | — |
| Make | Agilent[1] | — |
| Model | 1290 Infinity II[1] | 0010-03485[3] |
| Flexible Pump model | G7104A[2] | — |
| High Speed Pump model | G7120A[2] | — |
| Multisampler model | G7167B[2] | — |
| Multicolumn Thermostat model | G7116B[2] | — |
| Diode Array Detector model | G7117B[2] | — |
| Variable Wavelength Detector model | G7114B[2] | — |
| Injection cycle time | As low as 5 seconds[2] | — |
| Pressure range | Up to 1300 bar[2] | — |
| Solvent cabinet maximum volume | 6 L[2] | — |
| Configuration | — | WP AL 300mm PVD[3] |
| OEM | — | Applied Materials[3] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[4] |
| Process | — | PVD[5] |
| Wafer size | — | 300mm[6] |
| Version | — | Spares[6] |
| Part Number | — | 0010-03485[3] |
| Manufacturer | — | Applied Materials[3] |
| Process Type | — | PVD (Physical Vapor Deposition)[3] |
| Application (Material) | — | Aluminum (AL)[3] |
| Wafer Diameter (associated) | — | 300 mm[3] |