Comparison ledger
Agilent E 4991 A Impedance Analyzer, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | E 4991 A Impedance AnalyzerAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent E 4991 A Impedance Analyzer | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Model | E 4991 A Impedance Analyzer[1] | 0010-03485[5] |
| OEM | Agilent[1] | Applied Materials[5] |
| Product name | E4991A RF Impedance/Material Analyzer[2] | — |
| Operating frequency | 1 MHz to 3 GHz[2] | — |
| Measurement range | 0.13 Ω to 20 kΩ (within 10% accuracy)[2] | — |
| Basic impedance accuracy | 0.8%[2] | — |
| DC bias source | 0 to ±40 V, ±50 mA DC bias (Option 001)[2] | — |
| Material measurement firmware | Permittivity and permeability measurements up to 1 GHz (Option 002)[2] | — |
| Test port connector | 7 mm connector[3] | — |
| Display | 8.4-inch TFT color LCD[3] | — |
| Interfaces | LAN, GPIB, USB[2] | — |
| Mass storage | 3.5-inch floppy disk drive and hard disk drive[3] | — |
| Control system | Windows-based user interface / customized Windows operating system[3] | — |
| Weight | Main unit: 17 kg; test head: 1 kg[4] | — |
| Frequency range | 1 MHz to 3 GHz[2] | — |
| Impedance measurement range | 0.13 Ω to 20 kΩ (within 10 % accuracy)[2] | — |
| Permittivity measurement range | Up to 1 GHz[2] | — |
| Permeability measurement range | Up to 1 GHz[2] | — |
| Test port | 7 mm connector[4] | — |
| Programming support | Built-in VBA[2] | — |
| Configuration | — | WP AL 300mm PVD[5] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[6] |
| Process | — | PVD[7] |
| Wafer size | — | 300mm[8] |
| Version | — | Spares[8] |
| Part Number | — | 0010-03485[5] |
| Manufacturer | — | Applied Materials[5] |
| Process Type | — | PVD (Physical Vapor Deposition)[5] |
| Application (Material) | — | Aluminum (AL)[5] |
| Wafer Diameter (associated) | — | 300 mm[5] |