Waferpedia

Comparison ledger

PA 200 HSversus0010-03485 Magnet Assy

Agilent PA 200 HS, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
PA 200 HSAgilent
0010-03485 Magnet AssyApplied Materials
OEMAgilentApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAgilent PA 200 HSApplied Materials 0010-03485 Magnet Assy
Cited variants
  • PA 200 HS CV[1]
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Specifications
Wafer size8 inch[2]300mm[6]
Configuration—WP AL 300mm PVD[3]
OEM—Applied Materials[3]
Model—0010-03485[3]
Description—MAGNET ASSY, WP AL 300MM PVD[4]
Process—PVD[5]
Version—Spares[6]
Part Number—0010-03485[3]
Manufacturer—Applied Materials[3]
Process Type—PVD (Physical Vapor Deposition)[3]
Application (Material)—Aluminum (AL)[3]
Wafer Diameter (associated)—300 mm[3]
Sources (6)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]inventory listing
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]layla-ec.comlayla-ec.com
  6. [6]fabsurplus.comfabsurplus.com