Comparison ledger
Aixtron G 5 HT IC 2 MOCVD Reactor, Applied Materials 0020 12458 Part, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | G 5 HT IC 2 MOCVD ReactorAixtron | 0020 12458 PartApplied Materials |
|---|---|---|
| OEM | Aixtron | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Aixtron G 5 HT IC 2 MOCVD Reactor | Applied Materials 0020 12458 Part |
| Specifications | ||
| Software Version | AIXACT 6.0.0.27[1] | — |
| PLC | 6.0.3830[1] | — |
| Configuration | SLC[1] | Insulator,Side Match,Hdp-Cvd Ultima Plus[2] |
| Process | InGaN MOCVD Epitaxy[1] | — |
| Wafer | 6 x 6"[1] | — |
| Metal Organic Sources | TMln x 3, 100 ppm SiH4 in Ar x 20 x 2[1] | — |
| Concentration Monitors (2) | Epison4 x 3 for TMln, Epison4 x 2 for TEGa[1] | — |
| Purifiers | Entegris Getters for H2 & N2, Nanochem for NH3[1] | — |
| Heating System | RF Coil with Trumpf Huttinger RF Generator TruHeat 7120[1] | — |
| Glove Box | MBraun Nitrogen Glovebox with Controller[1] | — |
| Process Pump | Ebara ESA 80 W[1] | — |
| DOR & Glove BoxPumps | Anesta Iwata Scroll Pump (2)[1] | — |
| Abatement | Unisem UN 2000 A-WHG (shared across 2 reactors)[1] | — |
| Reactor Chiller | Tek-Temp Recirculating Closed Loop Chiller[1] | — |
| Gas Foil Rotation (GFR) | Individual GFR Control for Each Puck[1] | — |
| OEM | Aixtron[1] | — |
| Model | G 5 HT IC 2 MOCVD Reactor[1] | 0020 12458[2] |
| Chiller Baths | 6 available for MO sources[1] | — |
| Ceiling Temperature Controle | present[1] | — |
| In-Situ Pyrometry | available[1] | — |
| Vintage | 2010[1] | — |
| Concentration Monitors | (2) Epison4 x 3 for TMln, Epison4 x 2 for TEGa[1] | — |
| Asset number | — | 146526[2] |
| Make | — | Applied Materials[2] |
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