Comparison ledger
Applied Materials 0010-03254 E Chuck, Perkin Elmer 11 067 Ion Gun Control, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | 11 067 Ion Gun ControlPerkin Elmer |
|---|---|---|
| OEM | Applied Materials | Perkin Elmer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Perkin Elmer 11 067 Ion Gun Control |
| Specifications | ||
| Beam voltage range | — | 0 to +5000 volts DC[1] |
| Focus ratio | — | 70-100% of beam voltage[1] |
| Minimum focus voltage | — | 100 volts DC[1] |
| Raster amplitude | — | 0 to +200 volts peak-to-peak[1] |
| Pressure range | — | 0-50 mP[1] |
| Anode current | — | 25 uA at 50 mP[1] |
| Output current | — | 50 mA[1] |
| Stability | — | 1% per hour[1] |
| Ripple | — | 0.2 V peak-to-peak[1] |