Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Applied Materials Centura 5200 DXZ, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Centura 5200 DXZApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Applied Materials Centura 5200 DXZ |
| Cited variants | — | |
| Specifications | ||
| Configuration | WP AL 300mm PVD[3] | — |
| OEM | Applied Materials[3] | Applied Materials[7] |
| Model | 0010-03485[3] | Centura 5200 DXZ[7] |
| Description | MAGNET ASSY, WP AL 300MM PVD[4] | PECVD (Chemical Vapor Deposition)[1] |
| Process | PVD[5] | — |
| Wafer size | 300mm[6] | — |
| Version | Spares[6] | 200 mm[1] |
| Part Number | 0010-03485[3] | — |
| Manufacturer | Applied Materials[3] | — |
| Process Type | PVD (Physical Vapor Deposition)[3] | — |
| Application (Material) | Aluminum (AL)[3] | — |
| Wafer Diameter (associated) | 300 mm[3] | — |
| Wafer Size | — | 200 mm[1] |
| Process Type (available) | — | PECVD, SACVD[1] |
| Number of Chambers (SACVD variant) | — | 3[2] |
| Chemistry (SACVD variant) | — | TEOS[2] |
| Vintage | — | 01.06.1997[2] |