Comparison ledger
Applied Materials 0010-03485 Magnet Assy, ASML PAS 5500 60, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | PAS 5500 60ASML |
|---|---|---|
| OEM | Applied Materials | ASML |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | ASML PAS 5500 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Parts have been swapped out[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | 200 mm (eight-inch)[7] |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Resolution | — | 450 nm[6] |
| Wavelength | — | 365 nm (i-line)[6] |
| Throughput | — | up to 48 wafers per hour (200 mm, 55 exposures, 200 mJ/cm²)[7] |
| Design rule | — | 0.45 µm (450 nm)[7] |