Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusIH 1800

Applied Materials 0010-03485 Magnet Assy, Edwards IH 1800, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
IH 1800Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards IH 1800
Cited variants—
  • iH-1800 / iH 1800 / iH1800[1]
Specifications
ConfigurationWP AL 300mm PVD[2]Fully refurbished[6]
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Pumping speed—1,060 CFM[7]
Ultimate pressure—7.5 x 10^-4 Torr[7]
Inlet—ISO160[7]
Exhaust—KF40[7]
Motor—3 Phase, 208-230/460V, 50/60Hz[7]
Weight—1,107 lbs[7]
Dry pump component—HCDP160[1]
Mechanical booster component—HMB1800[1]
Pumping chamber lubrication—None (dry, no lubricating or sealing fluid)[1]
Motor cooling—Enclosed, water-cooled[1]
Gas system—Purge gas introduced into HCDP pump, with economiser gas mode[1]
Type—Dry pump[7]
Pump composition—HCDP160 dry pump with HMB1800 mechanical booster pump[1]
Sources (7)Every fact above is drawn from these public sources
  1. [1]ajvs.comajvs.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]inventory listing
  7. [7]provac.comprovac.com