Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Nikon NSR SF 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | NSR SF 200Nikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Nikon NSR |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | HDD not included[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Chamber Type | — | Asahi[5] |
| Reticle Size | — | 6"[5] |
| Field Size | — | 26[5] |
| RL Linrary | — | L10+10[5] |
| Reticle PD/PPD | — | YEs[5] |
| Reticle SMIF | — | No[5] |
| Wafer Chuck Type | — | Pin[5] |
| Wafer Loader Type | — | Type 3[5] |
| Pre Alignment 2 | — | OF[5] |
| In-Line | — | Right[5] |
| Wafer Carrier Table | — | Right[5] |
| Alignment Sensor | — | LSA/FIA/LIA[5] |
| Mini Computer | — | Alpha[5] |
| Software Version | — | MCSV: Ver E5.21F Tool[5] |
| Laser | — | Gigaphoton G21K2[5] |
| Laser Total Shot | — | 19420.349 Mpls[5] |
| Wavelength | — | 248 nm[6] |
| Lens NA | — | 0.63[6] |
| Exposure Area | — | 26 mm x 33 mm[6] |
| Reduction Ratio | — | 1/4[6] |
| Resolution | — | < 150 nm[6] |
| Throughput (300 mm) | — | > 110 wafers/hour[6] |
| Throughput (200 mm) | — | > 120 wafers/hour[6] |
| Wafer Size (stated by source) | — | 200/300 mm[6] |
| Wafer Size (other source) | — | 6 inch[5] |