Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Perkin Elmer Lambda 35, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Lambda 35Perkin Elmer |
|---|---|---|
| OEM | Applied Materials | Perkin Elmer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Perkin Elmer Lambda 35 |
| Cited variants | — | |
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Instrument type | — | Scanning double-beam spectrometer for the UV/Vis range; operation by PC[1] |
| Wavelength range | — | 190 nm to 1100 nm[1] |
| Spectral bandwidth | — | 0.5 nm, 1 nm, 2 nm, 4 nm (selectable fixed slit widths)[1] |
| Detector | — | Photodiodes, one for the sample beam and one for the reference beam[1] |
| Radiation sources | — | Prealigned deuterium and halogen lamps[1] |
| Photometric range | — | Transmission 0% to 100%; absorbance -6.000 to 6.000; concentration units 1 to 9999[1] |
| Photometric accuracy | — | Absorbance ±0.003 at Absorbance = 1 at 440 nm, 546.1 nm and 635 nm; absorbance ±0.015 at Absorbance = 1 at 257 nm and 350 nm[1] |
| Stray radiation | — | Transmission <0.02% at 220 nm, 340 nm and 370 nm; absorbance >2 at 200 nm with potassium chloride solution against distilled water[1] |
| Baseline stability | — | Absorbance <0.0003 per hour at 500 nm after warmup[1] |
| Beam center height | — | 15 mm above cell holder bottom[1] |
| Optical pathlength in sample compartment | — | 121 mm[1] |
| Interface | — | One RS 232 C interface (serial) for connecting a PC[1] |
| Use cases | — | Measurements on liquids, solids, pastes and powder samples[6] |
| Modes of operation | — | Scanning, wavelength program, time-drive, rate, quant, scanning quant[7] |
| Type | — | Scanning double-beam spectrometer for the UV/Vis range; operation by PC[1] |
| Dimensions | — | Width: 650 nm; Height: 260 nm; Depth: 560 nm[1] |
| Mass | — | 26 kg approx.[1] |
| Power requirements | — | 100 V to 240 V AC, 50/60 Hz; 250 VA[1] |
| Ambient operating temperature | — | 15 ºC to 35 ºC[1] |
| Humidity range | — | 20% to 80% relative humidity without condensation[1] |
| Wavelength accuracy | — | ±0.1 nm[1] |
| Wavelength reproducibility | — | ±0.1 nm[1] |
| Lamp change | — | Automatically at 326 nm (software selectable over the whole wavelength range)[1] |
| Scan speeds | — | 7.5, 15, 30, 60, 120, 240, 480, 960, 1920 and 2880 nm/min[1] |
| Baseline linearity | — | 2 nm slit: Absorbance ±0.0005 (corrected: 200 nm to 1100 nm, scan speed 240 nm/min, smooth 2)[1] |
| Baseline noise | — | 2 nm slit: Absorbance < 0.00006 RMS; Absorbance < 0.0002 peak-to-peak 3 min at Absorbance = 0, wavelength 500 nm and response 2 s[1] |
| Data output | — | One RS 232 C interface (serial), for connecting a PC[1] |
| Optical system | — | All-reflecting optical system with silica-coated optical components and a holographic concave grating with 1053 lines/mm in the center[1] |
| Beam cross-section | — | 0.5 nm slit ca. 0.25 mm x 7 mm; 1 nm slit ca. 0.5 mm x 7.5 mm; 2 nm slit ca. 1 mm x 7.5 mm; 4 nm slit ca. 2 mm x 7.5 mm[1] |
| Grating | — | Holographic concave grating with 1053 lines/mm in the center[1] |
| Baseline stability (drift) | — | Absorbance < 0.0003 per hour at 500 nm after warmup[1] |