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Comparison ledger

0010-03485 Magnet Assyversus3303 Lift Off

Applied Materials 0010-03485 Magnet Assy, Veeco 3303 Lift Off, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsVeeco
Category——
Wafer size——
Process node——
Introduced——
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FamilyApplied Materials 0010-03485 Magnet AssyVeeco 33xx
Specifications
ConfigurationWP AL 300mm PVD[1]HVS (High Velocity Spray) Chamber up to 40 PSI[5]
OEMApplied Materials[1]—
Model0010-03485[1]3303[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]HPC solvent lift off process[5]
Wafer size300mm[4]6 inch[5]
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
HPC solvent lift off process—500-2300 PSI1)[5]
Machine type—Lift Off Machine[5]
Process pressure—500-2300 PSI[5]
Chamber pressure—up to 40 PSI[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com