Comparison ledger
Applied Materials 0010-13622 RF Match for, Canon Anelva C 7100 PVD Cluster, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | |
|---|---|---|
| OEM | Applied Materials | Canon |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Canon Anelva |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Triple transfer chambers (loadlock/cluster 1, cluster-to-cluster, cluster 2) w/ Brooks Magna-Tran robots[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Wafer size | — | 8 inch[2] |
| Transfer chambers | — | Triple transfer chambers (loadlock/cluster 1, cluster-to-cluster, cluster 2) with Brooks Magna-Tran robots[2] |
| Process module CH-A | — | CIS CH-A process module with Shimadzu TMP turbo pump[2] |
| Process module CH-B | — | Etch/OXI-EX (CH-B) process module with Inficon Transpector XPR3 RGA, Shimadzu TMP-3203LM-N1 turbo pump[2] |
| Process module CH-E | — | 8PVD-EX (CH-E) process module with CTI Cryogenics PowerEco cryopump[2] |
| Process module CH-F | — | 5PVD-EX (CH-F) process module with Shimadzu TMP turbo pump[2] |
| Process module CH-1A | — | 8PVD-EX (CH-1A) process module with cryopump[2] |
| Cooling module CH-1B | — | Cooling (CH-1B) process module[2] |
| RTA module CH-1C | — | RTA (CH-1C) process module[2] |
| Process module CH-1D | — | 4/4PVD-1D process module with Anelva P-126CL turbopump[2] |
| Process module CH-1F | — | 4PVD-EX (CH-1F) process module with CTI Cryogenics PowerEco cryopump[2] |
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