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0010-13622 RF Match forversusGasonics Vector

Applied Materials 0010-13622 RF Match for, Lam Research Gasonics Vector, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Gasonics VectorLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLam Research Gasonics Vector
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]SiN Oxide[2]
Model0010-13622[1]Vector[2]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
User Interface—screen & computer[4]
Equipment type—PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2]
Make—Lam / Novellus / Gasonics[2]
Application/material—SiN Oxide[2]
Vintage—2003[2]
Additional configuration—2x FOUP Loadports; Mini-Environment (Front End); Atmospheric Robot; User Interface: screen & computer; Light Tower; 2x Loadlocks; 2x Loadlock Cooling Pedestals; 2x Linear Transfer Modules; 4x Showerheads; Al Heater Pedestals with lift pins (station 1); Al Heater Pedestals (stations 2-4); Pneumatic Spindle; Integrated Liquid Delivery System (not on this particular configuration); Low Frequency RF Generator; High Frequency RF Generator; RF Match; Endpoint Controller; Gas Box; Local Power Box; 3x Super Input / Output Controller; Motion Controller; Module Controller[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing