Comparison ledger
Applied Materials 0010-13622 RF Match for, Ulvac Ei 5, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Ei 5Ulvac |
|---|---|---|
| OEM | Applied Materials | Ulvac |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Ulvac Ei 5 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | — |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| EB source | — | ULVAC EGO-40M+Power supply EPS-1000F 10kW x1 set[2] |
| Resistance heating evaporation source | — | 6.8kW 3 sets[2] |
| Main vacuum pump | — | ULVAV CRYO-U16P+C30VR X1[2] |
| Assisted pump | — | Mechanical pump ULVAC EC803[2] |
| Deposition controller | — | ULVAC CRTM-9000[2] |
| Vacuum gauge | — | ULVAC G-TRAN BMR2 ULVAC G-TRAN BRP2,SP1[2] |
| Deposition history | — | Au, PT, Ti[2] |
| Substrate rotation | — | Revolving flat plate type[2] |
| Substrate heating | — | None[2] |
| Lamp heater | — | 6 kW x 4 sets[3] |
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