Comparison ledger
Applied Materials 0010-16392 ESC Assembly, Oxford Instruments Plasmalab 80 Plus RIE-PECVD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-16392 ESC AssemblyApplied Materials | Plasmalab 80 Plus RIE-PECVDOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-16392 ESC Assembly | Oxford Instruments Plasmalab 80 |
| Specifications | ||
| OEM | Applied Materials[1] | — |
| Model | 0010-16392[1] | — |
| Type | ESC Assembly[1] | — |
| Wafer Size | 300 mm[2] | — |
| Electrode Configuration | Dual[2] | — |
| Dual Chamber (Chamber A | — | PECVD & Chamber B: RIE)[3] |
| Configuration | — | It has some problems. It was setup with PC interface and it appears to have lost signals for RF power, pressure and chamber switch was erratic.[3] |
| Power Supply Upgrade | — | ENI Power Supply upgraded to MKS[3] |
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