Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Cymer ELS 6610, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | ELS 6610Cymer |
|---|---|---|
| OEM | Applied Materials | Cymer |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | — |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | ELS 6610[3] |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Equipment Type | — | Excimer Laser[3] |
| Application | — | Lithography light source[4] |
| Technology | — | Deep ultraviolet (DUV)[5] |
| Version | — | Facilities[3] |
| Manufacturer | — | Cymer[3] |
| Laser Type | — | Excimer Laser[3] |
| Used In | — | ASML PAS 5500/850 D[5] |