Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, KLA SFS 6220, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | SFS 6220KLA |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | KLA SFS 6220 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Defect Sensitivity | — | 0.1 micron (PSL STD)[3] |
| Haze Sensitivity | — | 0.02 ppm[3] |
| Haze Resolution | — | 0.002 ppm[3] |
| Accuracy | — | within 1%[3] |
| Wavelength | — | 488nm (Argon Ion laser)[3] |
| Wafer Size (supported) | — | 4 - 8 inch[3] |
| Calibration | — | NIST Calibrated[3] |
| Power Requirements | — | 208V/60Hz, 17A[3] |