Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Oxford Instruments PC2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | PC2000Oxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Oxford Instruments PC2000 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| System type | — | plasma system[3] |
| User login system | — | Password controlled user login with different levels of access[3] |
| Data logging | — | Continuous system data logging for traceability of each wafer and process run[3] |
| Communication standard | — | Fully GEM/SECS compatible[3] |
| Cluster control | — | Ability to control a tool cluster from a single interface and PC[3] |
| Operating system | — | Windows XP[4] |
| PLC type | — | Black PLC (older, not upgradeable)[4] |
| Software type | — | Process tool software[3] |
| Interface | — | Front-end visual[3] |
| Recipe management | — | Yes[3] |
| User access control | — | Password-controlled[3] |
| Communication protocol | — | GEM/SECS compatible[3] |
| Host operating system | — | Windows XP[4] |
| Customization | — | Per machine[4] |