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0010-22161 High EFF RF Matchversus3640 Wafer Disk Analyzer

Applied Materials 0010-22161 High EFF RF Match, Rigaku 3640 Wafer Disk Analyzer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsRigaku
Category——
Wafer size——
Process node——
Introduced——
Production run—1977–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchRigaku 3640 Wafer Disk Analyzer
Specifications
MakeApplied Materials[1]Rigaku[3]
Model0010-22161[1]3640 Wafer / Disk Analyzer[3]
DescriptionHTESC PH 1 REV A[2]—
ConditionUsed[2]—
Stock NumberBM6628[2]—
Wafer size—8 inch[3]
Sample size—8" max.[4]
Sample stage—XYθ driving system, spin mechanism (for center measurement)[4]
Elements for simultaneous analysis—16 elements max.[4]
Goniometer—Fixed type goniometer for each element; scanning type goniometer for Ti through U[4]
Collimator—2 kinds for automatic exchange; selectable from 5, 10, 15 and 20 mm dia.[4]
Automatic vacuum degree controller—13 Pa ± 1 Pa (APC: automatic pressure controller)[4]
Temperature stabilizer—Available[4]
X-ray tube—Rh target, 3 kW[4]
X-ray generator—Maximum output: 3 kVA[4]
Heat exchanger—Distilled water recirculation system (with ion exchange resin)[4]
Vacuum pump—Dry pump (QDP-80)[4]
Cassette-to-cassette—Optional[4]
Orientation flat/notch—Adjustable[4]
Software—Multiwindow/multitask FP method for multilayer thin film wafer measuring direction setting program[4]
Mapping—Optional[4]
Personal computer—DOS/V compatible[4]
Operating system—OS/2 Warp[4]
Display/peripherals—15" color CRT, ink jet printer[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]tarasemi.comtarasemi.com
  3. [3]Equipment inventory listing
  4. [4]ptwsingapore.comptwsingapore.com