Comparison ledger
Applied Materials 0010 47763, SPTS CPX Pegasus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | CPX PegasusSPTS |
|---|---|---|
| OEM | Applied Materials | SPTS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | SPTS CPX Pegasus |
| Specifications | ||
| Configuration | 2nd Source New[1] | 2 Chambers[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Frequency | — | 60Hz[4] |
| Source RF Generator | — | MKS 6.5 kw RF Power Generator[4] |
| Platen RF Generator | — | MKS/ENI ACG 3B 13.56MHz RF Generator[4] |
| Rotary Pump | — | 3 PCS[4] |
| Turbo pump | — | 2 PCS[4] |
| DI Water | — | SMC HRZ-L2-DY chiller[4] |
| Silicon oil | — | SMC HRZL-D chiller[4] |
| Manufacturer | — | SPTS / STS (also listed under KLA / SPTS)[4] |
| Wafer Size | — | 8 inch (200 mm)[4] |
| Wafer Size (alternate) | — | 200 mm[5] |
| Number of Chambers | — | 2[4] |
| Voltage | — | 380 Volts[4] |
| Voltage (alternate) | — | 400 Volts[5] |
| Current | — | 160 Amps[4] |
| RF Source Generator | — | MKS 6.5 kW RF Power Generator[4] |
| RF Platen Generator | — | MKS/ENI ACG 3B 13.56MHz RF Generator[4] |
| Rotary Pump Quantity | — | 3 PCS[4] |
| Turbo Pump Quantity | — | 2 PCS[4] |
| Pressure System Components | — | MKS Baratron gauge (10-4~10-1 m Torr), MKS 750 capacitance (10-760 Torr), BOC EDWARDS Active gauge (10-4mTorr~10Torr), ESC (ceramic)[4] |
| Gases Supported | — | SF6, C4F8, O2, N2, Ar[4] |
| Gas Flow Rates | — | C4F8 400 sccm, SF6 1200 sccm, Ar 500 sccm, O2 200 sccm[4] |
| Wafer Handling Robot | — | Brooks MagnaTran 7[4] |
| Cooling/Heating Systems | — | House Water, DI Water chiller (SMC HRZ-L2-DY), Silicon oil chiller (SMC HRZL-D), Insert Heaters[4] |
| Platform | — | CPX[5] |
| Module | — | Pegasus[5] |
| Database Version | — | 4.16[5] |
| Installation Type | — | Thru-Wall[5] |
| Wafer Flat Orientation | — | Round with notch[5] |
| Clamp Type | — | TDESC[5] |
| MFCs | — | MKS[5] |
| Pump Type | — | EDWARDS[5] |
| Cluster Transfer Pump | — | ALCATEL[5] |
| Dry Pumps | — | 1-DS80, 2-DS700[6] |
| Chillers | — | 1-HRZ001-L2-DV, 2-HRZ001-L-D[6] |
| Software | — | DSIE CP0148[6] |
| Gasbox | — | Peg/HRM[5] |
| EPD (End Point Detection) | — | No[5] |
| Vintage Year | — | 2006[4] |
| Vintage Year (alternate) | — | 2012[5] |
| SF6 | — | Purity 99.999%(5N)[4] |
| C4F8 | — | Purity 99.999%(5N)[4] |
| O2 | — | Purity 99.9995%(5N5)[4] |
| N2 | — | Purity 99.9995%(5N5)[4] |
| Ar | — | Purity 99.9995%(5N5)[4] |
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