Comparison ledger
Applied Materials 0020 18455 Part, Applied Materials Centura Ultima+ HDP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0020 18455 PartApplied Materials | Centura Ultima+ HDPApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0020 18455 Part | Applied Materials Centura |
| Specifications | ||
| Configuration | Shaft,Rf In Local Match, Hdpcvd,Rev3[1] | Ch A – Ultima+ (ENI AM200 RF Generator)[2] |
| Wafer Size (Ultima+ HDP) | — | 6 inch[2] |
| RF Generator (Ch A) | — | ENI AM200[2] |
| Multi-slot cooldown (Ch E) | — | Present[2] |
| Platform & Chamber Model | — | Centura Ultima[3] |
| Wafer Size (Platform support) | — | 200mm and 300mm[3] |
| Process Chambers | — | 2[3] |
| Remote Plasma Source | — | MKS iAstron[3] |
| Electrostatic Chuck | — | Ceramic with backside He, water cooling, wafer temperature monitor[3] |
| Gas Ring | — | Ceramic gas nozzles[3] |
| Center Gas Nozzle/Baffle | — | Present[3] |
| Factory Interface Robot | — | Kawasaki[3] |
| Load Ports | — | 2[3] |
| Mainframe | — | 4.0 with metal buffer lid[3] |
| RF Generators | — | Top, Side, and Bias[3] |
| Vacuum System - Throttle Valve | — | Stepper Turbo Throttle Valve with 3 veins[3] |
| Vacuum System - Gate Valve | — | Pendulum Gate Valve[3] |
| Vacuum System - Turbo Pump | — | Present[3] |
| Gas Boxes | — | 15 stick AP Gas Boxes (incl. Methane line)[3] |
| Endpoint Detector | — | Foreline FTIR[3] |
| Foreline | — | Heater Jacketed[3] |
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