Waferpedia

Comparison ledger

0020 18698 PartversusEndura

Applied Materials 0020 18698 Part, Applied Materials Endura, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
EnduraApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartApplied Materials Endura
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[1]Cu SIP[2]
Deposition—Directional eSIP TaN (barrier/seed)[5]
Capability—Sputters into contacts & vias[5]
Chambers—eSIP TaN .Tin - Multiple Degas[5]
Process type—Physical Vapor Deposition (PVD)[2]
Wafer size—6 inch[6]
Chamber material—Copper (Cu)[2]
Vintage year—1995[6]
OEM—Applied Materials[2]
Model—Endura[2]
Equipment type—PVD Chamber (Physical Vapor Deposition)[2]
Product details—12" - Cu SIP - Part Numbers: 0010-04662, 0040-48541, 0040-03982[2]
Vintage—1996 Vintage[7]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]inventory listing
  6. [6]Equipment inventory listing
  7. [7]Equipment inventory listing