Waferpedia

Comparison ledger

0020 18698 PartversusIBD

Applied Materials 0020 18698 Part, Oxford Instruments IBD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
IBDOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18698 PartOxford Instruments IBD
Cited variants—
  • Oxford IBD Chamber (Ion Beam Deposition) with hollow cathode DC ion source[1]
  • Oxford IBD Chamber (Ion Beam Deposition) with RF gridded ion source[2]
Specifications
ConfigurationDial Cover, Side Local Match, Hdpcvd, Ul[3]with hollow cathode DC ion source[1]
Technology—Ion Beam Deposition[1]
Ion Source (configurable)—Hollow cathode DC ion source or RF gridded ion source[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]inventory listing