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0041-39086 ESC PartversusSLR 770 ICP Deep Silicon

Applied Materials 0041-39086 ESC Part, Plasma-Therm SLR 770 ICP Deep Silicon, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
OEMApplied MaterialsPlasma-Therm
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Plasma-Therm SLR 770
Specifications
Configuration—Load lock shuttle lock transfer[1]
Process Gas—O2, Ar, SF6, C4F6[1]
Chiller—Neslab HX300[1]
Power Box—Square D[1]
Manufacturer—Plasma-Therm[1]
Model—SLR 770[1]
Category—Etch[1]
Wafer sizes—4 inch[1]
Tool type—Single-chamber inductively coupled plasma etcher[2]
Wafer handling—Load lock shuttle lock transfer[1]
Load lock—Single wafer semi-auto load lock[3]
Application—Deep silicon etch[3]
Gas box—Horiba SEC-E40 (4)[1]
Process gases—O2, Ar, SF6, C4F6[1]
Controller and RF generator—RF Power Products RFPP I22050001 & I20050007[1]
Adaptive pressure controller—VAT PM-5[1]
Heater controller—Plasmatherm PC OS[1]
RF generator—RF Power Products RFPP RF5S & AM-5[1]
Turbo pump and controller—Leybold MAG 2000; Leybold MD 2000[1]
Vintage—01.06.1998[3]
Power—1.0 kW ICP RF package; 2 kW generator limited to 1.0 kW; 500 W RF bias[3]
Gas box lines—5 lines[3]
Additional process gases—CHF3, C4F8, SF6, Ar, O2[3]
Dry pump—Edwards ih80[3]
Load lock dry pump—Edwards nxds[3]
Load lock turbo pump—Leybold[3]
Turbo pump—Edwards STPA-1303CV[3]
Electrical—380VAC 3 phase[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]fabsurplus.comfabsurplus.com