Comparison ledger
Applied Materials Centura TPCC RTP XE+, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura TPCC RTP XE+Applied Materials | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Applied Materials | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura TPCC | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| CH A | XE+ Non-Toxic ATM[1] | — |
| Configuration | Chemraz O-Ring[1] | — |
| Edge Ring | S2[1] | — |
| Bearing Type | Standard[1] | — |
| CH B | Empty[1] | — |
| CH C | Empty[1] | — |
| CH D | Empty[1] | — |
| CH E | Single Slot Fast Cooldown[1] | — |
| CH F | Single Slot Fast Cooldown[1] | — |
| Gas Line Purge | N2-10 SLM[1] | — |
| Gas Line 1 | 02-10 SLM[1] | — |
| Wafer Size | 8 inch[1] | — |
| Chamber A Configuration | XE+ Non-Toxic ATM - Chemraz O-Ring - RGA Port and Valve - MWBC - Edge Ring: S2 Bearing Type: Standard[1] | — |
| Chamber E and F Configuration | Single Slot Fast Cooldown[1] | — |
| Robot | Asyst LPT2200 SMIF Robot[1] | — |
| Controller | Vita Computer Controller (Modular Controller)[1] | — |
| Gas Delivery | 10 Ra Gas Panel, Top Feed Gas Line Input, Multiple Line Drop Gas Distribution, Gas Line Purge: N2-10 SLM, Gas Line 1: O2-10 SLM, Gas Line 2: N2-20 SLM, Gas Line 3: O2 1 SLM, STEC Z500 MFC Type First Manifold[1] | — |
| Heat Exchanger | SMC 40 GPM Stainless Steel Heat Exchanger[1] | — |
| Gas Line 2 | N2-20 SLM[1] | — |
| Gas Line 3 | 02 1SLM SLM[1] | — |
| Gas Line 4 | None[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[2] |
| Cryo DRIE etch rate | — | up to 5 µm/min[2] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →