Waferpedia

Comparison ledger

Producer GTversus1512e

Applied Materials Producer GT, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Producer GTApplied Materials
1512eTegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run2006–—
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials ProducerTegal 1512e
Cited variants
  • Applied Materials Producer GT Etcher[1]
  • Applied Materials (AMAT) Producer GT APF[2]
—
Specifications
Chamber ASiCoNi[1]—
Chamber BFrontier Etch[1]—
ConfigurationMissing:[1]—
OEMApplied Materials[3]—
ModelProducer GT[3]—
Wafer size12 inch[3]—
Chamber namesA, B, C[2]—
Current equipment statusIncoming[2]—
Date of manufacture2009-01-01[2]—
Configured wafer size300mm[2]—
System power rating110 AC 3-Phase for system[2]—
Loading configuration3 LP / 7 cooling station / 25 wafer FOUP[2]—
Process capabilityAdvanced lithography and etch patterning down to the 22nm technology node[4]—
Tool type—Industrial RIE plasma etcher system[5]
Stated configuration—With modules assembly for CI-4222[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]macquarie.commacquarie.com
  3. [3]Equipment inventory listing
  4. [4]marketscreener.commarketscreener.com
  5. [5]semistarcorp.comsemistarcorp.com