Applied Materials
VIISta HCP+ alternatives
Comparable Ion Implantation equipment documented in the Waferpedia catalog.
6 comparable tools
Varian
Viision 200
Ion Implantation
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
Applied Materials
0010-14300 Magnet Assy
Ion Implantation
Varian
0216 7696, E 11368072 ESC
Ion Implantation
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
Varian
160 XP
Ion Implantation
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
Varian
160 XP Ion
Ion Implantation
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.
Axcelis
17099370 Outer strike plate
Ion Implantation
Axcelis 17099370 Outer strike plate is an outer strike plate used with the Axcelis GSD 200.
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