Waferpedia

Comparison ledger

PAS 2000versus017-0024-01 Prealigner

ASML PAS 2000, Brooks 017-0024-01 Prealigner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMASMLBrooks
CategoryLithographyLithography
Wafer size——
Process node——
Introduced1984—
Production run1985–—
LifecycleLegacy—
Lifecycle milestones1984 First product · 1984 First product introduced—
Control system——
Generation——
FamilyASML PAS 2000Brooks 017-0024-01 Prealigner
Specifications
Product typeLithography machine[1]—
Wafer motion mechanismOil pressure instead of electric motors[1]—
Critical dimension1.0 to 1.3 micron[2]—
Overlay accuracy0.25 micron[2]—
Wafer movement mechanismOil pressure[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]en.wikipedia.orgen.wikipedia.org
  2. [2]chiphistory.orgchiphistory.org