Waferpedia

Comparison ledger

200 PCU Photoresist Stabilizerversus1 EC 101 R 485 Photoresist Spinner

Axcelis 200 PCU Photoresist Stabilizer, Headway 1 EC 101 R 485 Photoresist Spinner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMAxcelisHeadway
CategoryResist ProcessingResist Processing
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAxcelis NV GSD 200Headway 1 EC 101 R 485 Photoresist Spinner
Specifications
Configuration14 Amps[1]—
Voltage380 V[1]—
Frequency50 Hz[1]—
Phase3 Phase[1]—
Vacuum requirement—23" Hg[3]
Electrical—115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[3]
Electrical power—115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[3]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing