Axcelis
GSD 200 E 2 High Current alternatives
Comparable Ion Implantation equipment documented in the Waferpedia catalog.
6 comparable tools
Varian
E 500 EHPI Ion Implant
Ion Implantation
Varian E 500 EHPI Ion Implant System is a 6-inch wafer ion implant system with a Windows 7 control computer and V15.10.12 software.
Varian
E 500 High Current
Ion Implantation
The Varian E 500 High Current Implanter is a high-current ion implanter for 6-inch wafers.
Varian
Viision 200
Ion Implantation
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
Varian
Viision 200 Ion
Ion Implantation
The Varian Viision 200 is an ion implanter for 8-inch wafers.
Applied Materials
VIISta HE XP
Ion Implantation
The VIISta HE XP is a high-current ion implanter for semiconductor wafer processing.
Applied Materials
VIISta Plad High Current
Ion Implantation
Applied Materials / Varian VIISta Plad is a high current ion implanter with a 12-inch wafer size.
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