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Comparison ledger

2200 EVO Plusversus1 WBS 1 Wafer Substrate

Besi 2200 EVO Plus, Logitech 1 WBS 1 Wafer Substrate, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBesiLogitech
CategoryPackaging & BondingPackaging & Bonding
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBesi 2200Logitech 1 WBS 1 Wafer Substrate
Specifications
ConfigurationBuffer Line Input[1]—
MakeBesi / Datacon[2]—
Model2200 EVO Plus[2]—
Bond Force0.5N to 75N programmable[3]—
X/Y placement accuracy± 7 µm @ 3s[3]—
Theta placement accuracy± 0.10° @ 3s[3]—
Die attach throughputup to 7,000 UPH/module[3]—
Flip chip throughput with dippingup to 2,500 UPH/module[3]—
Flip chip throughput without dippingup to 3,200 UPH/module[3]—
Heated bond headup to 450°C (optional)[3]—
UV curing365 nm & 405 nm[3]—
Machine dimensions (LxDxH)1,160 mm x 1,225 mm x 1,750 mm[3]—
Weight1,300 kg[3]—
Wafer size4" - 12" (SEMI M1)[3]—
Frame sizeFF070, FF105, FF108, FF123; automatic change (others on request)[3]—
Substrate working range13” x 8” (325 mm x 200 mm)[3]—
Wafer Size—6 inch[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]besi.combesi.com
  4. [4]Equipment inventory listing