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Comparison ledger

017-0146-01 PrealignerversusMJB 4 Mask

Brooks 017-0146-01 Prealigner, SUSS MicroTec MJB 4 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
MJB 4 MaskSUSS MicroTec
OEMBrooksSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerSUSS MicroTec MJB
Specifications
Configuration—Front side Alignment[1]
Trinocular Split Field Microscope—Dual 5X & 10X Objectives[1]
OEM—SUSS MicroTec[2]
Model—MJB 4[3]
Exposure types—vacuum, hard, soft proximity contact[2]
Substrate size (max)—4 inches in diameter[2]
Mask/substrate thickness capacity—9.00 mm total[2]
Exposure optics—400 nm[2]
Lamps—allowing sub-micron exposure in vacuum contact[2]
Photoresist tones—positive and negative[2]
Alignment type—topside only[2]
Minimum alignment mark separation (binocular)—3.5 cm[2]
Typical pattern resolution—1 µm[2]
Achievable alignment resolution—1 µm[2]
Wafer sizes—2, 3, 4, 12 inch[1]
Alignment features (as listed by reseller)—front side alignment; trinocular split field microscope with dual 5X & 10X objectives; video camera; high resolution alignment; Suss power supply[1]
Contact exposure modes—vacuum, hard, soft, proximity contact[2]
Substrate size—up to 4 inches in diameter[2]
Maximum mask and wafer total thickness—9.00 mm[2]
Adjustment accuracy (X, Y, theta)—below 1 µm[2]
Exposure optics wavelength—400 nm[2]
Topside alignment—yes[2]
Wafer sizes (listing)—2, 3, 4, 12 inch[1]
Alignment type (listing)—Front side[1]
Microscope—Trinocular Split Field with Dual 5X & 10X Objectives[1]
Camera—Video Camera[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
  3. [3]Equipment inventory listing