Comparison ledger
Canon 5500 iZA, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5500 iZACanon | 1505 G 6 ENikon |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon 5500 iZA | Nikon 1505 |
| Cited variants |
| — |
| Specifications | ||
| Model type | i-Line (365nm) Stepper[2] | — |
| Wafer size | 300mm; 200mm[2] | — |
| Resolution | ≤0.35μm[2] | 650 nm[5] |
| Numerical Aperture (NA) | 0.45 ~ 0.57[2] | — |
| Reticle size | 6in. (0.25in. thick)[2] | — |
| Reduction ratio | 4:1[2] | — |
| Field size | 26mm x 33mm[2] | — |
| Overlay accuracy | ≤ 16nm (M+3)[2] | — |
| Throughput | ≥93wph (300mm); ≥155wph (200mm)[2] | — |
| Exposure wavelength | i-line (365nm)[2] | — |
| Lamp | 4.5kW high-pressured mercury lamp[2] | — |
| Overlay accuracy achieved | 16nm through reticle magnification compensation and through improvements in Z and tilt compensation accuracy, stage environment control accuracy, and calibration accuracy[2] | — |
| Platform | FPA-5000 platform[2] | — |
| Manufacturer | Canon[3] | — |
| Model | 5500 iZA[3] | 1505 G 6 E[4] |
| Tool type | i-line stepper lithography system[1] | — |
| Last confirmed date | August 22, 2023[3] | — |
| Configuration | — | 5" reticle[4] |
| Numerical Aperture | — | 0.54[5] |
| Reduction | — | 5x[5] |
| Exposure Field | — | 15 x 15 mm[5] |
| Alignment Accuracy | — | 130 nm[5] |
| Wafer Size | — | 4 inch[4] |
| Light Source | — | g-line[6] |
| Introduction Year | — | 1988[5] |
| NA (Numerical Aperture) | — | 0.54[5] |
| Make | — | Nikon[4] |
| Category | — | Stepper[4] |
| Wafer Sizes | — | 4 inch[4] |
| Exposure type | — | g-line[5] |
| NA | — | 0.54[5] |
| Exposure field | — | 9.3 x 18.8 mm[5] |
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