Comparison ledger
Canon FPA 3000 EX 5 Fine Pattern, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1998 Vintage · 1999 Vintage | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 3000 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Cymer ELS 5310[1] | — |
| Laser source | Cymer ELS 5310[1] | — |
| Chamber | Rasco TWB-CD-110 Compact Chamber[2] | — |
| Make | Canon[1] | — |
| Model | FPA 3000 EX 5[1] | — |
| Equipment type | Fine Pattern Aligner[1] | — |
| Vintage | 1998[1] | — |
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