Comparison ledger
CEE 100 Spin, Tokyo Electron Mark VIII, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 SpinCEE | Mark VIIITokyo Electron |
|---|---|---|
| OEM | CEE | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Tokyo Electron Mark |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Volts 115[2] | 2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block[3] |
| Gas | — | Polyimide[3] |
| OS | — | DOS[3] |
| 2D, 1WEE, 3HP, 4CHP, 3COL - Main Frame | — | Dual Block[1] |
| 2D, 1WEE, 9HP, 3COL - Main Frame | — | Dual Block[5] |
| Main Frame | — | Single Block[3] |
| Operating System | — | DOS 1996 Vintage[3] |
| Vintage | — | 1996[3] |
| Equipment type | — | Developer[3] |
| Make | — | Tel[3] |
| Model | — | Mark VIII[3] |
| Develop cups | — | 2[4] |
| Coat cup | — | 1[3] |
| Hot plates | — | 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate[3] |
| Chill plates | — | 4 chill plates[4] |
| Control software | — | DOS[3] |
| OEM | — | Tokyo Electron[3] |
| Control system / OS | — | DOS[3] |
| Type | — | Developer[3] |
| Coat Cups | — | 1[3] |
| Chill Hot Plates | — | 3[3] |
| Low Temp Hot Plates | — | 4[3] |
| High Temp Hot Plates | — | 1[3] |
| Chill Plates | — | 3[4] |
| Process Gases | — | Polyimide[3] |
| Vintage Year | — | 1996[3] |
| WEE | — | Right[4] |
| Process configuration | — | 2 develop, 1 coat, 3 chill hot plates, 4 low temp hot plates, 1 high temp hot plate, WEE - Main Frame: Single Block - Gas: Polyimide - OS: DOS[3] |
| Low temp hot plates | — | 3[4] |
| High temp hot plate | — | 1[3] |
| WEE Right | — | present[4] |
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