Comparison ledger
CEE 100, Veeco AP 300 E Lithography, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | AP 300 E LithographyVeeco |
|---|---|---|
| OEM | CEE | Veeco |
| Category | Lithography | Lithography |
| Wafer size | 6" | Warped Wafer Handling to 500 um |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Veeco AP 300 E Lithography |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Warped Wafer Handling to 500 um[3] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Configuration | — | 2.0 um Resolution, Extended Field, ghi-line Broadband Lens Dual 1200 Watt Lamp llluminator[3] |
| Universal Size/Warped Wafer Kit | — | 200 mm and 300 mm[3] |
| Dual Flip Aperture | — | ([68mm/44mm/34.2mm] x 26mm)[3] |
| Power Source | — | 208 V three phase, 5 wire, 150 amp[3] |
| Resolution | — | 2.0 µm[3] |
| Optics | — | extended-field, ghi-line broadband lens[3] |
| Illuminator | — | Dual 1200 Watt Lamp Illuminator[3] |
| Field size | — | 68 x 26 mm[3] |
| Warped wafer handling | — | to 500 um[3] |
| Alignment system | — | PATMAX MVS Alignment System[3] |
| MVS alignment spectrum | — | 530 - 570 nm[3] |
| Reticle stack | — | 6 slot, manual front loading[3] |
| Reticle type | — | 6 x 6 x 0.25 inch[3] |
| Wafer handling | — | Universal Size/Warped Wafer Kit: 200 mm and 300 mm[3] |
| Wafer thickness handling | — | 0.4 mm to 2.0 mm[3] |
| Edge exposure system | — | WEE 3[3] |
| Edge exclusion system | — | one exclusion ring; exclusion ring width 1 - 5 mm protection available[3] |
| Communications | — | GEM HSMS[3] |
| Auto filter changer | — | ghi-line auto filter changer[3] |
| Open cassette adapter | — | QTY 2[3] |
| Environmental chamber | — | shipped from supplier (white)[3] |
| Lens protection | — | requires closed loop cooler[3] |
| Lens distortion reference | — | no lens matching[3] |
| Closed loop cooler | — | included[3] |
| Enhanced bottom pellicle | — | included[3] |
| Gen 4 Fanout 300 | — | 300mm wafer size only[3] |
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