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1000 Hot PlateversusAlpha 303 i

CEE 1000 Hot Plate, Tokyo Electron Alpha 303 i, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
1000 Hot PlateCEE
Alpha 303 iTokyo Electron
OEMCEETokyo Electron
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateTokyo Electron Alpha 303
Cited variants—
Specifications
Configuration4"[2]K type / Mto[3]
TypeHot Plate[2]Furnace[3]
Wafer Size4 inch[2]—
Process applications—Anneal, PIQ, D-Poly, NIT, Alloy[4]
Process type—Nitride[1]
Vintage year—2005[3]
1000 Hot Plate entryAlpha 303 i entryAsk about these tools →Share experience with this comparison →

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing