Comparison ledger
CEE 1000 Hot Plate, Tokyo Electron Alpha 303 i Vertical, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Alpha 303 i VerticalTokyo Electron | |
|---|---|---|
| OEM | CEE | Tokyo Electron |
| Category | Thermal / Diffusion | Thermal / Diffusion |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 1000 Hot Plate | Tokyo Electron Alpha 303 |
| Specifications | ||
| Configuration | 4"[1] | TEOS[2] |
| Type | Hot Plate[1] | Vertical Furnace[2] |
| Wafer Size | 4 inch[1] | 12 inch (300 mm)[2] |
| Manufacturer | — | Tokyo Electron (Tel)[2] |
| Model | — | Alpha 303 i[2] |
| Process (TEOS) | — | TEOS[2] |
| Process (Nitride) | — | Nitride[3] |
| Process (Cure) | — | Cure[4] |
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