Comparison ledger
Disco DCS 1460 Wafer Cleaner Spin, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | |
|---|---|---|
| OEM | Disco | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Disco DCS | Semitool 11600 SRD |
| Specifications | ||
| Configuration | Table upgrade for VCSEL cleaning[1] | Ceramic[3] |
| Maximum workpiece size | Φ300 mm[2] | — |
| Application frame | 2-12[2] | — |
| Table RPM range | 100 to 3,000 min⁻¹[2] | — |
| Setting time for cleaning/drying | 0 to 999 sec[2] | — |
| Cleaning nozzle speed | 1 to 37.5 °/sec[2] | — |
| Cleaning range | Φ450 mm (up to 310 x 310 mm)[2] | — |
| Cleaning pressure range | 2.3 to 11.8 MPa[2] | — |
| Equipment dimensions (W×D×H) | 500 × 650 × 1,220 mm[2] | — |
| Equipment weight (Dry mass) | Approx. 144 kg[2] | — |
| Max. workpiece size | Φ300 mm[2] | — |
| Table RPM | 100 to 3,000 min^-1[2] | — |
| Cleaning nozzles | Standard high pressure cleaning nozzle; optional atomizing cleaning nozzle; dual nozzle configuration possible[2] | — |
| Operator interface | 4 inch LCD touch panel[2] | — |
| Manufacturer | — | Semitool[3] |
| Model | — | 11600 SRD[3] |
| Equipment type | — | Spin Rinse Dryer[3] |
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