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Comparison ledger

DWL66versusNSR 2205 i 8 A i-Line

Heidelberg Instruments DWL66, Nikon NSR 2205 i 8 A i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
DWL66Heidelberg Instruments
OEMHeidelberg InstrumentsNikon
CategoryLithographyLithography
Wafer size6"6"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHeidelberg Instruments DWL66Nikon NSR 2205
Cited variants—
Specifications
Resolution40 nm, 100 nm, 200 nm, 400 nm[2]0.5µm[3]
Minimum feature0.5 µm[2]—
Laser sources244 nm, 363 nm, 413 nm, 442 nm[2]—
Substratesglass, silicon or any other flat materials[2]—
Exposurephotoresist[2]—
Image size140 mm x 140 mm[2]—
Substrate sizeup to 200 mm by 200 mm[1]—
Computer Type—PDP11[3]
Rentical Size—5 Inch[3]
Field Sizes—15 / 17.5 / 20mm[3]
Wafer Size—6 Inch Flat[3]
Reticle Libraries—1[3]
Wafer Loader—Type 1[3]
Wafer size—Wafer Loader Pre-alignment 2[3]
Configuration—Barcode Reader[3]
Wafer Loader Indexers—2[3]
Autofocus—Single Point[3]
Chuck Type—Ceramic Ring Chuck[3]
Water Stage—Ballscrew[3]
MCS2 Version—2.4B[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]inventory listing