Comparison ledger
Hitachi 1305 BSG 3, YES G1000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1305 BSG 3Hitachi | G1000YES |
|---|---|---|
| OEM | Hitachi | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi 1305 BSG 3 | YES G1000 |
| Specifications | ||
| Plasma frequency | — | 40 kHz[1] |
| Powered shelves | — | 4 powered shelves[1] |
| Plasma modes | — | 5 plasma modes: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, Downstream Ion trap[1] |
| Chamber | — | 1/2" 6061-T6 aluminum chamber[1] |
| Process area per tray | — | 15.13" W x 15.39" D[1] |
| Matching | — | Variable Frequency Matching (VFM)[1] |
| Interface | — | Touch Screen Interface[1] |
| Design | — | Unique downstream protective design; totally charge-free plasma[1] |
| Control | — | State logic control of output with input monitoring[1] |
| Number of powered shelves | — | 4[1] |
| Chamber material | — | 1/2" 6061-T6 aluminum[1] |
| Variable Frequency Matching (VFM) | — | Present[1] |
| Touch screen interface | — | Present[1] |
| Downstream protective design | — | Totally charge-free plasma[1] |
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