Comparison ledger
Karl Suss MJB-3, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MJB-3Karl Suss | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Karl Suss | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 3" | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Karl Suss MJB-3 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| OEM | Karl Suss[1] | — |
| Model | MJB-3[1] | — |
| Type | Contact/proximity aligner[1] | — |
| Illumination wavelengths | 365 nm or 405 nm[1] | — |
| Resists | Used with a variety of both positive and negative photoresists[1] | — |
| Location | FabLab | Teaching Lab[1] | — |
| Maximum substrate diameter | up to 3"[1] | — |
| Sample compatibility | works for smaller samples[1] | — |
| Light options | 365 nm or 405 nm light[1] | — |
| Photoresist compatibility | a variety of both positive and negative photoresists[1] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →