Comparison ledger
KLA 1.112 PSL Wafer, KLA Alpha Step D 300 Stylus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | KLA Alpha Step |
| Specifications | ||
| Configuration | NIST Traceable[1] | Issue with the style module[3] |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| Instrument type | — | Stylus-based surface profiler[4] |
| Stylus tip radius | — | 2 µm[4] |
| Step height measurement range | — | 50 nm to 300 µm[4] |
| Measurement principle | — | Stylus placed in contact with and dragged along the substrate surface; vertical deflection measures change in step height[4] |
| Supported substrate types | — | Silicon, Silicon Germanium, Quartz, Sapphire, Glass, Germanium, Silicon Carbide, Gallium Nitride, III-V, Gallium Arsenide, Polymer, Carbon Polymer Based, Lithium Niobate[4] |
| Supported substrate sizes | — | Pieces, 2 inch, 3 inch, 4 inch, 6 inch wafer[4] |
| Maximum load | — | 1[4] |
| Cleanliness | — | Flexible[4] |
| Stylus scan distance used in roughness testing | — | 3 mm[5] |
| Manufacturer location | — | KLA-Tencor Corporation, Milpitas, CA[5] |
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