Comparison ledger
KLA 1.112 PSL Wafer, Nikon SMZ-2B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SMZ-2BNikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | Nikon SMZ-2B |
| Specifications | ||
| Configuration | NIST Traceable[1] | Desk mount boom stand or base plate boom stand[4] |
| Wafer Size | 8 inch[1] | — |
| NIST Traceable | True[1] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[2] | — |
| OEM | — | Nikon[3] |
| Model | — | SMZ-2B[3] |
| Section | — | Binocular Model[3] |
| Location | — | Z17[3] |
| Microscope Type | — | Stereo[4] |
| Observation Method | — | Reflected light[4] |
| Magnification Range | — | 8 - 50X (typical factory)[4] |
| Height | — | 9.38 in[4] |
| Width | — | 12 in[4] |
| Depth | — | 7.25 in[4] |
| Power Requirements | — | 115V[4] |
| Observation mode | — | Reflected light observation[4] |
| Typical factory magnification | — | 8-50X[4] |
| Light source compatibility | — | High intensity light source[4] |
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