Comparison ledger
KLA .204 PSL Wafer, Siemens D 5000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | D 5000Siemens | |
|---|---|---|
| OEM | KLA | Siemens |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | Siemens D 5000 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[1] | — |
| Traceability | NIST[2] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[1] | — |
| Detector configuration | — | PSD (Position Sensitive Detector), solid-state detector, standard scintillation counter[3] |
| Goniometer operation modes | — | Horizontal or vertical mode for reflection or transmission measurements[3] |
| Goniometer geometry conversion | — | Converts from theta:2theta geometry to theta:theta; converts to parallel beam[3] |
| Automation | — | Microprocessor control of data collection; host computer for experimental setup and data analysis[3] |
| Attachments | — | Eulerian cradle for texture, open Eulerian cradle for texture/stress, automatic sample changer, high and low temperature stages, programmable sample rotation[3] |
| Variable aperture slits | — | Computer controlled variable aperture slits in incident and diffracted beam paths to control divergence and reduce background[3] |
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