Comparison ledger
KLA .496 PSL Wafer, Olympus DSU, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | DSUOlympus | |
|---|---|---|
| OEM | KLA | Olympus |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Olympus DSU |
| Specifications | ||
| Configuration | NIST Traceable[1] | on a IX81 stand[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Manufacturer | — | Olympus[4] |
| Model | — | DSU[3] |
| Z drive | — | motorized[3] |
| Optics | — | filter cube[3] |
| Light source | — | Prior arc lamp and xenon light source (for calcium imaging)[3] |
| Computer | — | Windows 7 computer running Slidebook[3] |
| Camera | — | Hamamatsu EMCCD C9100-23B[3] |
| Objectives | — | 100x UPLANAPO; 100x UPLFLN 100x; 10x UplanSApo NA 0.4; 40x UplanSAPO NA 0.9; 40x UAPO N340 NA 1.35; 20x UplanSApo NA 0.75; 20x UplanApo NA 0.7 Ph2; 20x UPlan FLN NA 0.5 Ph1; 60x Plan Apo N NA 1.42; 60x PlanApo Ph2 NA 1.4; 4x UplanSapo NA 0.16[3] |
| Microscope type | — | spinning disk confocal microscope[5] |
| XY stage | — | motorized XY stage on one system; manually controlled XY stage on the other[5] |
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