Comparison ledger
Lam Research 2300 V 2 Kiyo 45, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2300 V 2 Kiyo 45Lam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 2300 | Oxford Instruments 100 ICP Fluorine |
| Cited variants |
| — |
| Specifications | ||
| Configuration | Polysilicon[1] | — |
| Process capability | Polysilicon[1] | — |
| Chamber configuration | 4ch (4-channel)[1] | — |
| Process gases | SiCl4, BCl3, HBr, CH4, CHF3, Cl2, CH2F2, CH3F, NF3, O2, CF4, He, Ar, N2[1] | — |
| Vacuum pump | Edwards STP XA2703CV[1] | — |
| Make | Lam[4] | — |
| Model | 2300 V 2 Kiyo 45[4] | — |
| Category | Etcher[4] | — |
| Process | Polysilicon etching[1] | — |
| Number of Chambers | 4ch[1] | — |
| Gas Chemistry | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] | — |
| Pump | Edwards STP XA2703CV[1] | — |
| Number of chambers | 4[1] | — |
| Process chambers | 4[1] | — |
| Process Type | Polysilicon[1] | — |
| Chamber Count | 4[1] | — |
| Supported Gases | SiCl4 / BCl3 / HBr / CH4 / CHF3 / Cl2 / CH2F2 / CH3F / NF3 / O2 / CF4 / He / Ar / N2[1] | — |
| Vintage (some units) | 2007, 2008, 2009[2] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[5] |
| Cryo DRIE etch rate | — | up to 5 µm/min[5] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[5] |
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