Comparison ledger
Lam Research 2300 Versys Kiyo 45, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2300 Versys Kiyo 45Lam Research | 1512eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 2300 Versys Kiyo 45 | Tegal 1512e |
| Specifications | ||
| OEM | Lam Research[1] | — |
| Model | 2300 Versys Kiyo 45[1] | — |
| Category | Etch[2] | — |
| Wafer size | 300mm[3] | — |
| Tool type | high-density plasma etch system[2] | Industrial RIE plasma etcher system[4] |
| Application | advanced patterning applications[2] | — |
| Processes | conductor and silicon etch processes[2] | — |
| Etch characteristics | precise anisotropic etching, excellent critical dimension control, and high aspect ratio capability[2] | — |
| Stated configuration | — | With modules assembly for CI-4222[4] |
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